Insights into the ferroelectric orthorhombic phase formation in doped HfO2 thin films

Despite the extensive research on HfO2-based thin films, the ferroelectric orthorhombic phase formation remains unclear. This work proposes a physical picture throughout the entire annealing process to describe the phase transition. Subsequently, the phase evolution at various doping and annealing temperatures is illustrated based on a kinetic model formalized from the classical nucleation theory. It is found that the formation of the ferroelectric orthorhombic phase depends not only on a modest doping concentration but also on the thermal activation of the t-to-o phase transition provided by a sufficient annealing temperature. In addition, phase transition rates correlated to the monoclinic phase formation are effectively suppressed by doping. The exploration of combined effects of annealing parameters indicates a more decisive role of the annealing temperature rather than the keeping time for induced ferroelectricity, and the doping impact becomes significant when a critical annealing temperature is reached. This work provides an understanding for exploring the kinetic effect on the phase transition in HfO2-based thin films, which helps improve ferroelectricity in doped HfO2 ferroelectric films.