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Plasmonic lens imaging with some resolution enhancement methods are investigated in this paper, mainly by physical modeling and numerical simulations. The imaging model is based on the refined optical transfer function with extra reflection in imaging space and measured in variant magnetic and electric field components. The influences of structured light illumination and mask patterns' modifications are considered as well. As experimental demonstrations, L-shaped slits pattern with a half-pitch of 60 nm is successfully imaged with 50 nm air distance, by using plasmonic cavity lens lithography and off-axis illumination with 365 nm wavelength light. This study is believed to provide the model and methods for the design of high resolution plasmonic lens employed in nano lithography and optical storage etc.
Zhao et al. (Mon,) studied this question.