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Abstract The chemical vapor deposition (CVD) of poly( para ‐xylylene)s (PPX) is an enabling technology for materials design as well as for numerous high‐performance applications. Additionally, PPX possesses of a unique set of structure–property relationships that can be tuned over a wide range. Different strategies vary from functionalization of the most used precursor 2.2paracyclophane to the testing of new precursors and the copolymerization with various monomers. In this review, some recent developments on synthesis and properties of this unique class of polymers, the PPX, are reported.
Moss et al. (Mon,) studied this question.