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In order to design submicrometer Si MOSFETs properly, the specific contact resistivity rho /sub c/ has to be controlled. The rho /sub c/ is known to be a function of both the barrier height and the Si surface doping concentration. An existing theory is used to generate rho /sub c/, emphasizing details in the practical regimes, with a careful choice of proper parameters such as the tunneling effective mass, which is a function of both temperature and doping concentration.>
Ng et al. (Fri,) studied this question.
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