Key points are not available for this paper at this time.
Wet and dry processing technologies are applied to the development of high-aspect-ratio gratings in SiO2. Planar gratings having nearly vertical sidewalls and periods of 3000 Å are used as the basic structure for generating ultraviolet polarizers which perform at wavelengths well below 3000 Å. Extinction ratios of 0.5 at wavelengths of 2400 Å have been obtained. With new techniques available for generating fine-period surface gratings, it should be possible to fabricate planar polarizers with high polarization efficiencies at even shorter wavelengths.
Sonek et al. (Sun,) studied this question.