Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties

Lukas Mai

Friedrich-Alexander-Universität Erlangen-Nürnberg

Nils Boysen

Fraunhofer Institute for Microelectronic Circuits and Systems

Ersoy Subaşı

Ruhr University Bochum

RSC Advances

Fudan University

Ruhr University Bochum

Paderborn University