Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Key Points

• This research aims to explore the use of sulfur hexafluoride in plasma etching processes to achieve better efficiency and sustainability.
• Conducted a parametric study on plasma etching dynamics using sulfur hexafluoride.
• Analyzed chromium mask selectivity in etching processes.
• Evaluated pathways toward zero-global-warming-potential fluorine plasmas.
• Demonstrated improved etch dynamics with sulfur hexafluoride compared to traditional methods.
• Achieved higher chromium mask selectivity.
• Identified methods to reduce global warming potential in plasma etching processes.