Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Alane Lim

doi:10.1063/10.0042430

February 5, 2026Scilight

Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

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Key Points

This research aims to explore the use of sulfur hexafluoride in plasma etching processes to achieve better efficiency and sustainability.
Conducted a parametric study on plasma etching dynamics using sulfur hexafluoride.
Analyzed chromium mask selectivity in etching processes.
Evaluated pathways toward zero-global-warming-potential fluorine plasmas.
Demonstrated improved etch dynamics with sulfur hexafluoride compared to traditional methods.
Achieved higher chromium mask selectivity.
Identified methods to reduce global warming potential in plasma etching processes.

Implication

Parametric study demonstrates improved etch dynamics in plasma etching, suggesting environmental benefits.

Abstract

A parametric study reveals more sustainable etch dynamics, chromium mask selectivity, and pathways toward zero-global-warming-potential fluorine plasmas.

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Cite This Study

Alane Lim (2026) studied this question.

synapsesocial.com/papers/698828eb0fc35cd7a8848da7 https://doi.org/10.1063/10.0042430

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Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Key Points

Implication

Abstract

Discussion

Cite This Study

Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Key Points

Implication

Abstract

Discussion

Cite This Study

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