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October 21, 2026Scilight

An unsolved mystery cause of semiconductor defects

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Abstract

Traditional aluminum oxide polishing significantly raises sample resistivity and results in trace defects.

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Cite This Study

Hannah Richter (2026) studied this question.

synapsesocial.com/papers/6adaf8a166e5e605f69e0e35 https://doi.org/10.1063/10.0047227

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Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

1On the impact of sample preparation on scanning spreading resistance microscopyOriginal Research · 2026
2Degenerate Defect States in Metal‐Oxide‐Semiconductor Transistors2025
3Sputter-Metallization-Induced Electronic Defects in Thermal SiO2Original Research · 2001 · 5 citations
4Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging2024
5Tunneling Atomic Layer-Deposited Aluminum Oxide: a Correlated Structural/Electrical Performance Study for the Surface Passivation of Silicon JunctionsOriginal Research · 2019 · 11 citations

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