Modern synchrotron x-ray beamlines demand reflective optics with higher surface profile accuracy to achieve diffraction-limited focusing. This necessitates advanced metrology instruments capable of delivering repeatable measurements in the nanometer to sub-nanometer range. Slope ranges exceeding 15 mrad (0.86°) and greater pose significant challenges for mirror metrology using conventional interferometric methods. To address this, we present a new relative angle determinable stitching interferometry instrument featuring a parallel flexure-based mechanical design. This approach enhances vibration and thermal stability while maintaining a compact and lightweight system. Initial measurements of a cylindrical mirror with a 16 m radius of curvature and a slope range of 5 mrad demonstrate nanometer-level repeatability. Comprehensive system characterization suggests the potential for achieving sub-nanometer repeatability with further refinement to the instrument.
Lienhard et al. (Mon,) studied this question.