Regulatory mechanism of chelating agents on the chemical mechanical polishing performance of soft magnetic alloys and DFT theoretical study

Puntos clave

• Chelating agents improve chemical mechanical polishing performance in soft magnetic alloys.
• Results indicate a significant enhancement in polishing efficiency, with performance metrics notably increased.
• Density functional theory was used to investigate the interactions between chelating agents and alloys.
• Findings highlight the need for further exploration of regulatory mechanisms in polishing processes.