Inicio
Explorar
nav.journalClub
Tendencias
Más
synapse
⌘+K
Idioma
Español
Español
Residue-free embedding of electrodeposited copper mesh via interfacial adhesion engineering for high-performance flexible transparent electrodes | Synapse
March 3, 2026
Residue-free embedding of electrodeposited copper mesh via interfacial adhesion engineering for high-performance flexible transparent electrodes
YZ
Yongliang Zhang
XL
Xueyu Li
Ningbo University
ZW
Zhilong Wang
Chinese Academy of Sciences
Ver todo
Puntos clave
Flexible transparent electrodes improved through interfacial adhesion engineering and residue-free embedding.
Key evidence shows a significant increase in performance metrics and durability in multi-layer mesh structures.
Assessment using electrodeposited copper meshes enhances conductivity and flexibility in material design for applications.
This approach may enable broader applications in electronic devices, with further exploration needed in practical implementations.
Mark Helpful
Me gusta
Save
Guardar
Relay
Compartir
Mark Helpful
Me gusta
Save
Guardar
Relay
Compartir
Cite This Study
Copy
Zhang et al. (Sat,) studied this question.
synapsesocial.com/papers/69a7613fc6e9836116a2efb1
https://doi.org/https://doi.org/10.1016/j.apsusc.2026.166319