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Investigating the impact of rapid thermal annealing atmosphere on the properties of sputtered SnO thin films with a tellurium capping layer | Synapse
March 3, 2026
Investigating the impact of rapid thermal annealing atmosphere on the properties of sputtered SnO thin films with a tellurium capping layer
BZ
Bin Zhang
Kunming University of Science and Technology
KG
Kai-Jhih Gan
ZZ
Zefu Zhao
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Puntos clave
Sputtered tin oxide films showed significant property changes based on the thermal annealing atmosphere used.
The study observed varying conductivity and optical properties in films annealed in different atmospheres.
Analysis involves investigation of sputtered films with a tellurium capping layer to enhance performance features.
Findings highlight potential applications in electronic devices, indicating a need for further material optimization.
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Zhang et al. (Thu,) studied this question.
synapsesocial.com/papers/69a76772badf0bb9e87e0efe
https://doi.org/https://doi.org/10.1016/j.vacuum.2026.115148