Comprehensive Study of Ultrathin TiN Films by ALD: Influence of Film Thickness and Substrate on Composition, Structure, Sheet resistance and Durability

Puntos clave

• The aim is to understand how the thickness and substrate affect the composition, structure, and properties of ultrathin titanium nitride films.
• TiN films were synthesized using atomic layer deposition (ALD).
• Various film thicknesses and substrates were tested.
• Analyses included assessment of crystallographic structure, surface chemistry, and mechanical durability.
• TiN films exhibited varying sheet resistance based on thickness and substrate type.
• Thicker films showed improved mechanical durability while maintaining proper crystallographic integrity.
• Surface chemistry analysis revealed differences influenced by substrate material.