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Vanadium dioxide thin films were deposited by radio-frequency (rf) reactive sputtering. An in situ anneal was found to improve stoichiometry, alter optical contrast, and increase grain size for a set of films. Biasing of a second set of substrates during deposition was found to increase the infrared (IR) transmission of films in the metallic state and degrade hysteresis characteristics.
Razavi et al. (Tue,) studied this question.