Lithography‐Free, Self‐Aligned Inkjet Printing with Sub‐Hundred‐Nanometer Resolution

Direct inkjet printing of sub-100 nm nanoscale gaps, without the need for any high-resolution lithography, is made possible by a novel self-aligned printing method (see Figure). The benefits of this method are demonstrated by fabrication of all-polymer transistor circuits, which exhibit switching speeds at least two orders of magnitude higher than those previously reported for inkjet-printed polymer devices.