Anomaly Detection Approaches for Semiconductor Manufacturing

Smart production monitoring is a crucial activity in advanced manufacturing for quality, control and maintenance purposes. Advanced Monitoring Systems aim to detect anomalies and trends; anomalies are data patterns that have different data characteristics from normal instances, while trends are tendencies of production to move in a particular direction over time. In this work, we compare state-of-the-art ML approaches (ABOD, LOF, onlinePCA and osPCA) to detect outliers and events in high-dimensional monitoring problems. The compared anomaly detection strategies have been tested on a real industrial dataset related to a Semiconductor Manufacturing Etching process.