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A new form of microfabrication is presented in which spherical colloidal particles are used to define a large area lithographic mask. A monolayer of colloidal particles is deposited in either random or ordered array over the entire surface of a macroscopic substrate. Large area random or ordered mosaic arrays of identical submicron microcolumnar structures are produced by using the colloidal particles as either an etching or deposition mask.
Deckman et al. (Sun,) studied this question.
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