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ADVERTISEMENT RETURN TO ISSUEPREVReviewNEXTChloride-Based CVD Growth of Silicon Carbide for Electronic ApplicationsHenrik Pedersen*†, Stefano Leone†, Olof Kordina†, Anne Henry†, Shin-ichi Nishizawa‡, Yaroslav Koshka§, and Erik Janzén†View Author Information† Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden‡ National Institute of Advanced Industrial Science and Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan§ Department of Electrical and Computer Engineering, Mississippi State University, Mississippi State, Mississippi 39762, United States *E-mail: email protectedCite this: Chem. Rev. 2012, 112, 4, 2434–2453Publication Date (Web):December 2, 2011Publication History Received11 July 2011Published online2 December 2011Published inissue 11 April 2012https://pubs.acs.org/doi/10.1021/cr200257zhttps://doi.org/10.1021/cr200257zreview-articleACS PublicationsCopyright © 2011 American Chemical SocietyRequest reuse permissionsArticle Views3552Altmetric-Citations100LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Deposition,Epitaxy,Layers,Precursors,Silicon Get e-Alerts
Pedersen et al. (Fri,) studied this question.