A monolithic charge electrode array suitable for use in a multiple channel ink jet printing apparatus has been fabricated by anisotropic etching of trapezoidal slots through a

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Kuhn et al. (Sun,) studied this question.

synapsesocial.com/papers/6a192ffbf3c200df105800d6 https://doi.org/https://doi.org/10.1109/t-ed.1978.19261

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

1Ink jet printing nozzle arrays etched in silicon1977 · 149 citations
2High Frequency Recording with Electrostatically Deflected Ink Jets1965 · 236 citations
3A Water-Amine-Complexing Agent System for Etching Silicon1967 · 309 citations
4Contact metallurgy for shallow junction Si devices1976 · 39 citations
5Fabrication of novel three-dimensional microstructures by the anisotropic etching of1978 · 311 citations

Silicon charge electrode array for ink jet printing | Synapse

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

1Ink jet printing nozzle arrays etched in silicon1977 · 149 citations
2High Frequency Recording with Electrostatically Deflected Ink Jets1965 · 236 citations
3A Water-Amine-Complexing Agent System for Etching Silicon1967 · 309 citations
4Contact metallurgy for shallow junction Si devices1976 · 39 citations
5Fabrication of novel three-dimensional microstructures by the anisotropic etching of1978 · 311 citations