Structural and dielectric modulation of NiTiO3 thin films deposited by pulsed spray pyrolysis technique via post-annealing | Synapse
March 3, 2026
Structural and dielectric modulation of NiTiO3 thin films deposited by pulsed spray pyrolysis technique via post-annealing
Key Points
Improved dielectric properties were recorded for NiTiO3 thin films after post-annealing, enhancing performance and stability.
The dielectric constant significantly increased to 400 at 1 kHz after annealing, compared to untreated films.
Analysis involved pulsed spray pyrolysis to create thin films, followed by various annealing temperatures to assess structural impacts.
These findings highlight the potential for enhanced electronic device applications using optimized NiTiO3 thin films under controlled processing conditions.