This handbook is a comprehensive guide to creating and maintaining oxygen‐free environments for processing oxygen‐sensitive materials. Oxygen‐free conditions are defined as having a sufficiently low oxygen partial pressure (<10 −10 ppm) to prevent significant surface oxidation during typical processing times. Conventional methods such as extreme high vacuum are technically challenging and expensive. Introducing silane into inert gas atmospheres provides a scalable and efficient alternative. Silane reacts rapidly with residual oxygen to form silicon dioxide and hydrogen, enabling stable, oxygen‐free environments at room temperature and atmospheric pressure. The handbook outlines practical methods for achieving oxygen‐free conditions using glove boxes, gas purification systems, and controlled gas mixtures. It provides detailed descriptions of system design, purging strategies, monitoring techniques, and sensor integration for oxygen, water, hydrogen, and silane concentration monitoring. It also covers operational aspects, dust management, and experimental setup. By combining theoretical observations with technical implementation guidelines, this resource enables researchers to reliably produce oxygen‐free conditions for a wide range of applications.
Zimmermann et al. (Fri,) studied this question.