Abstract： Quantum dot light-emitting diodes (QLEDs)， renowned for their high color purity， wide color gamut， and solution processability， are considered a pivotal technology for next-generation high-resolution displays.However， achieving high-resolution patterning without compromising the optical properties of quantum dots (QDs) remains a critical challenge hindering their practical application.Addressing this patterning bottleneck in high-resolution QLEDs fabrication， this work presents a novel patterning strategy based on nanoimprint lithography and thermally regulated transfer printing.The proposed method involves fabricating honeycomb microstructures on a polyvinyl butyral (PVB) surface using a silicon template， followed by selective filling of QDs controlled by solution wettability.Through a subsequent thermal-regulated transfer process， highly uniform QDs arrays with a feature size as small as 1. 5 μm and a resolution of 9 072 pixels per inch (PPI) are successfully prepared.By employing higher-resolution templates， we have further achieved QDs array with a maximum pixel density of 25 400 PPI.Furthermore， we successfully fabricated high-resolution red QLEDs device (9 072 PPI) by integrating the QDs array onto hole transport layer (HTL)， achieving a maximum external quantum efficiency (EQE) of 10. 91% and a peak luminance of 文章编号：
Xiaoting et al. (Thu,) studied this question.