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Abstract This paper reports the results of spin coating studies of an electron resist using several different solvents. Two problems which were frequently observed during the spin coating studies were the appearance of orange peel coatings and the formation of cloudy films. The appearance of orange peel is attributed to the rapid drying of low‐boiling solvents. The formation of a cloudy film is believed to be caused by the hygroscopic nature of the solvents used. The resist film thickness can be approximated by the relationship l = KC 2.1 /ω 0.5 , where l is film thickness, C is volume fraction of polymer resist, K is a constant and ω is the rotation speed. The results are compared with the theoretical modelings of Washo (1) and Meyerhofer (2).
Juey H. Lai (Thu,) studied this question.