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October 1, 1973Journal of Applied Polymer Science78 citations

Electron irradiation of poly(olefin sulfones). Application to electron beam resists

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MBM. J. BowdenLTL. F. Thompson

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Abstract

Abstract All the poly(olefin sulfones) examined degraded rapidly under electron irradiation. The dose required to effect a molecular weight distribution completely separated from the original distribution as required for fractional solution development was similar for all polymers, viz., 1–2 × 10 −6 coulomb/cm 2 . This indicates that they all have similar values for G (scission). The film thickness of the exposed area decreased at a rate dependent on olefin structure and temperature. This process, termed vapor development, has been attributed to concurrent chain scission and depolymerization. Factors determining the rate of depropagation are discussed.

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Cite This Study

Bowden et al. (1973) studied this question.

synapsesocial.com/papers/6a70fde75d37378ac1de283ehttps://doi.org/10.1002/app.1973.070171022
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