SUSS MicroTec (Germany)

Recent papers from SUSS MicroTec (Germany)

1. Full field lithography as an answer to heterogeneous packaging challenges2025
2. Multi-tier die stacking through collective die-to-wafer hybrid bonding2024
3. Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorberJournal of Micro/Nanopatterning Materials and Metrology · 2023
4. High quality diffractive optical elements (DOEs) using SMILE imprint techniqueAdvanced Optical Technologies · 2021
5. Optimization of EUV Reticle Cleaning by Evaluation of Chemistries on Wafer-Based Mimic Test Structures2016
6. ZnO/porous-Si and TiO2/porous-Si nanocomposite nanopillarsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2014
7. Ordered arrays of nanoporous gold nanoparticlesBeilstein Journal of Nanotechnology · 2012
8. Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substratesBeilstein Journal of Nanotechnology · 2011
9. Advanced mask aligner lithography: new illumination systemOptics Express · 2010
10. Detection of Interfacial Gas Bubbles in Wafer Bonded Silicon with Different Surface TreatmentsJournal of The Electrochemical Society · 2008
11. VNA calibrationIEEE Microwave Magazine · 2008