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Sputtered TiAl-Monolayers: Optimization of Thickness Uniformity and Stress over Target Lifetime | Synapse
March 3, 2026
Sputtered TiAl-Monolayers: Optimization of Thickness Uniformity and Stress over Target Lifetime
SW
Stephanie Weller
SD
Sebastian Döring
Fraunhofer Institute for Photonic Microsystems
ES
E. Schumann
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Key Points
Improved thickness uniformity significantly enhances the mechanical performance of the TiAl-monolayers.
Stress stability optimization was observed across various thickness ranges during the assessments.
Experimental analysis involved systematic testing to determine effective thickness and stress levels in monolayers.
Findings imply potential for prolonged material lifetimes under operational conditions, highlighting the importance of these parameters.
Abstract
247
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Weller et al. (Sun,) studied this question.
synapsesocial.com/papers/69a7616dc6e9836116a2f5d6
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