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This research paper explores the development of novel control methods for power supply in pulse magnetron sputtering systems. Pulse magnetron sputtering is a critical technique in thin-film deposition technology, widely used in various industrial applications, including semiconductors and coating processes. The study focuses on enhancing the precision and efficiency of power delivery to the sputtering targets by implementing advanced control strategies. These innovations aim to improve the consistency of film quality, reduce material waste, and increase the overall system reliability.
Kumar et al. (Thu,) studied this question.
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