Optimizing a novel green slurry by multifunctional pH regulators for ultra-smooth β-Ga2O3 (1 0 0) substrates via chemical mechanical polishing: experimental analysis, theoretical calculation and mechanistic insight

Key Points

• The optimization leads to smoother surfaces of β-Ga2O3 substrates through efficient chemical mechanical polishing techniques.
• Key findings indicate a significant improvement in surface finish, achieving a roughness reduction of over 75% in specific conditions.
• Assessment using experimental analysis and theoretical calculation provides mechanistic insight into the effects of pH regulators.
• Results highlight the potential for these multifunctional regulators to improve manufacturing processes in semiconductor technology.