Alpha-aumina thin films at low temperature by reactive HiPIMS

Key Points

• Alpha-alumina thin films exhibit excellent quality when deposited at low temperatures, outperforming conventional methods.
• Thin films produced under reactive high-power impulse magnetron sputtering (HiPIMS) show superior structural integrity and adhesion.
• Deposition through reactive HiPIMS provides a novel approach by utilizing plasma to create a robust film at lower temperatures than traditional methods.
• This technique supports innovative applications in electronics and coatings, highlighting potential in a range of industrial sectors.