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High-density growth of single-crystal CoSi nanowires via plasma-driven synergistic surface engineering | Synapse
March 3, 2026
High-density growth of single-crystal CoSi nanowires via plasma-driven synergistic surface engineering
GM
Gwangsik Mun
EC
Eugene Cho
YH
Yujin Han
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Key Points
High-density growth of single-crystal CoSi nanowires was achieved through advanced surface engineering techniques.
The innovative plasma-driven approach allows for a streamlined growth process, enhancing quality and efficiency.
Observational analysis of the growth process indicates significant improvements in crystalline quality at nanoscale dimensions.
These findings may enable further advancements in nanomaterials, though additional research is needed to verify scalability.
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Mun et al. (Wed,) studied this question.
synapsesocial.com/papers/69a760acc6e9836116a2da5a
https://doi.org/https://doi.org/10.1016/j.apsusc.2026.166201