X-ray detection is extensively utilized across diverse fields, including medical diagnosis and therapy, industrial non-destructive inspection, security screening, and scientific research. In X-ray imaging, array detectors play a pivotal role. In recent years, perovskite materials have emerged as the preferred choice for fabricating X-ray detectors, owing to their advantageous properties such as high X-ray attenuation coefficients, large carrier mobility-lifetime (µτ) product, tunable bandgaps, and low-cost fabrication processes. These properties enable the fabrication of detectors with both high sensitivity and superior detection limits. This review outlines fundamental operational principles and key performance metrics of X-ray detectors, followed by a comprehensive survey of large-area fabrication techniques for perovskite films and arrays. Furthermore, we focus specifically on recent research advances in thin-film transistor (TFT) and complementary metal oxide semiconductor (CMOS) integrated array X-ray detectors, detailing the fabrication processes compatible with TFT/CMOS technology. Finally, the review addresses the challenges of integrating perovskite X-ray detectors for practical applications, proposes potential solutions, and offers perspectives on the future development trends of array-integrated perovskite X-ray detectors.
Li et al. (Wed,) studied this question.