Molybdenum-tantalum (Mo-Ta) alloy sputtering targets are widely used in electronic applications owing to their excellent corrosion resistance, high thermal and electrical conductivity, and low electrical impedance. In this study, the sintering behavior and microstructural evolution of Mo-Ta alloys fabricated by spark plasma sintering (SPS) were investigated as a function of sintering temperature in the range of 1650-1800 °C. X-ray diffraction and microstructural analyses indicate that densification and alloying of the mixed Mo and Ta powders occur simultaneously during the SPS process. Increasing the sintering temperatures significantly enhances densification, and the compact sintered at 1750 °C achieves a relative density exceeding 99%, which is essential for high-quality sputtering target applications. The sintered alloys exhibit a clear temperature-dependent grain growth behavior together with a homogeneous microstructure and randomly oriented grains. These results demonstrate that appropriate control of sintering temperature enables the fabrication of dense and microstructurally uniform Mo-Ta alloys, providing valuable guidelines for optimizing sputtering target performance.
Oh et al. (Thu,) studied this question.