High laser induced damage threshold photoresists for nano‐imprint and 3D multi‐photon lithography

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser‐induced damage threshold. These photoresists showed to be candidates for the fabrication of micro‐optical elements (MOEs) using three‐dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.