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Abstract Representative polyolefin films were exposed to UV radiation from light sources having different intensities and spectral distribution including the quartz mercury arc fluorescent lamps, xenon arc, and sunlight. Films exposed were polyethylene, polypropylene, and sensitized polyethylene. The oligomer fractions supported microbial growth, but the high polymers gave minimal or no growth. It was concluded that photooxidative degradation of polyolefins does not per se induce progressive attack by microorganisms. Oligomers present originally in the polymer are augmented by those produced by photooxidation. These oligomers support growth if separated from the polymer matrix. These observations explain some of the contradictory reports in the literature concerning the microbial degradation of sensitized polyolefins.
Cornell et al. (Wed,) studied this question.