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We present a new class of periodic dielectric structures designed specifically to be amenable for fabrication at submicron lengthscales. The structures give rise to a sizable 3D photonic band gap and can be fabricated with materials widely used today in optoelectronic devices. They are made of three materials and consist essentially of a layered structure in which a series of cylindrical air holes are etched at normal incidence through the top surface of the structure. Our results demonstrate the existence of a gap as large as 14% of the midgap frequency using Si, SiO2, and air; and 23% using Si and air.
Fan et al. (Mon,) studied this question.
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