This article investigates the periodic structure of Ni/Ti X-ray mirrors with different configurations of Si buffer layers using X-ray reflectometry and standing X-ray wave techniques. Depth profiles of electron density and the distributions of Ni and Ti elements within the films were obtained. Films with period structures of Ti/Ni, Ti/Si/Ni, Ti/Ni/Si, and Ti/Si/Ni/Si were examined. The results show that the structure featuring a Si buffer layer inserted both between layers within a period and between the periods themselves (Ti/Si/Ni/Si) is optimal as a mirror configuration in terms of reflectometry intensity.
Seregin et al. (Wed,) studied this question.
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