For a simple submicron semiconductor structure we have calculated exactly the electron distribution $f(v,x)$ within a relaxation-to-local-equilibrium assumption for the collision term of the Boltzmann equation. This is the first calculation of the electron distribution in an inhomogeneous semiconductor. Large applied voltages produce a substantial ballistic peak in $f(v,x)$. But at all voltages contact inhomogeneities and local heating (and cooling) produce an I-V characteristic only weakly dependent on the scattering rate.
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Baranger et al. (1984) studied this question.
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