Compressed-CO2-Assisted Patterning of Polymers

We report a facile route to pattern polymer surfaces with the aid of compressed CO(2), termed the compressed-CO(2)-assisted imprint method. In this method, compressed CO(2) serves as a plasticizer for polymers (such as poly(methyl methylate) and polystyrene), which leads to a tremendous reduction in the glass transition temperature and viscosity of the polymers. Nylon fabrics and anode aluminum oxide porous membranes are used as molds, respectively, to pattern the softened polymers at relatively low temperatures, resulting in patterns at the scale of micrometers and nanometers on the surface of polymer films. The patterned structures can be tuned by changing CO(2) pressure and temperature in the imprinting process. This method is simple and environmentally benign. It also can be operated at low temperatures, for instance, ambient temperature.