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Bias-dependent scanning tunneling microscopy (STM), used in conjunction with atomic-charge superposition calculations, is shown to provide information on both atomic and electronic surface structure. Si (111) - (77) STM images measured with different bias voltages are compared with a number of recent structural models. Striking agreement is found with the stacking-fault-adatom model of Takayanagi. The unit-cell asymmetry found at negative sample bias is attributed to a stacking fault in one half of the unit cell, locally modifying the surface electronic structure.
Tromp et al. (Tue,) studied this question.
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