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Extreme ultraviolet (EUV) lithography has emerged as the most likely successor to 193-nm lithography. We provide a technical overview of EUV lithography and a discussion of the advantages of EUV lithography over alternative technologies. The key challenges in developing EUV exposure tools for high-volume production are discussed. A brief assessment is given of the cost of ownership of EUV lithography in comparison with 193-nm immersion lithography.
Peter J. Silverman (Sat,) studied this question.