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An n-channel MOS transistor with palladium gate was fabricated. The threshold voltage of this transistor was found to depend on the partial pressure of hydrogen in the ambient atmosphere. At a device temperature of 150 °C, 10 ppm hydrogen in air is easily detected, and in nitrogen or argon the sensitivity is considerably larger. A model, based on hydrogen adsorption on the palladium–silicon dioxide interface, is proposed. This model explains the device behavior and is also able to predict the absolute sensitivity for hydrogen in argon.
Lundström et al. (Mon,) studied this question.