Impact ionization model for dielectric instability and breakdown

A mechanism describing the incipient stages of intrinsic dielectric breakdown is formulated for the case of a wide-band-gap insulator with a low hole mobility. Dielectric instability results from the tunnel injection of electrons from the cathode contact and the subsequent impact ionization and field distortion which lead to dielectric breakdown. The model, evaluated for the parameters of SiO2, predicts an intrinsic breakdown voltage which approaches a lower limit of V=9+φ for very thin films, where φ is the cathode contact barrier in volts. As a result, both the electric field at breakdown and the critical current density increase rapidly as the film thickness is reduced below 200 Å.