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We report the switching dynamics and charge transport studies on Ru/HfO2/TiOx/Ru resistive random access memory devices in low resistance state (LRS), high resistance state (HRS), and virgin resistance state (VRS). The charge transport in LRS is governed by Ohmic conduction of electrons through local filamentary paths while it is governed by a combination of Frenkel-Poole emission and trap assisted tunneling process in HRS and VRS. The area of the filament in LRS is extracted and related to the compliance current. The thickness of the re-oxidized filament is extracted and related to the reset voltage in HRS. The energy consumed during the reset process was analyzed on the time-scale to experimentally demonstrate joule-heating mediated oxidation dynamics of filament during device reset.
Long et al. (2012) studied this question.