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Epitaxial growth of an organic ultrathin film has been confirmed for the first time by reflection high-energy electron diffraction (RHEED) during film growth. Copper phthalocyanine (CuPc) films were grown heteroepitaxially on a cleaved face of MoS 2 under high vacuum of ca. 4×10 -9 torr by a newly developed organic molecular beam epitaxy technique. The RHEED pattern revealed that epitaxially grown CuPc has its own lattice constant, which is completely different from that of MoS 2 even at the initial deposition stage.
Hara et al. (Wed,) studied this question.
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