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Experimental data and a new model of luminescence in glow-discharge-deposited amorphous silicon are described. The shape of the luminescence excitation spectrum rules out the previous model based on zero-phonon transitions. Instead, phonon interactions give a Stokes shift of 0.4–0.5 eV and the recombination is due to self-trapping of excitons bound to band tail localized states. The model explains the luminescence peak position and line width, the Stokes shift, and the thermal quenching of the luminescence intensity.
R. A. Street (1978) studied this question.