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We have demonstrated the validity of a new type of pressure-sensitive adhesion system using block copolymers containing a poly(2-ethylhexyl acrylate) (P2EHA) segment as the low glass transition temperature polymer and a poly(tert-butyl acrylate) (PtBA) or poly(isobornyl acrylate) (PIBoA) segment as the reacting polymer in the presence of a photoacid generator (PAG). This adhesion system can be easily debonded because of a change in the polymer properties of the adhesives by acid-catalyzed deprotection uniquely occurring during the photoirradiation followed by postbaking. We investigated the transformation of PtBA and PIBoA into poly(acrylic acid) using IR spectroscopy and a thermogravimetric analysis in the presence of p-toluenesulfonic acid and the PAGs. The block copolymers with a well-defined molecular structure were then synthesized by atom transfer radical polymerization, and their adhesive properties were evaluated using the 180° peel test. The block copolymers showed superior adhesion property than a random copolymer and polymer blends, due to the microphase separation of the block copolymers. A drastic change in the adhesive strength of the block copolymers was observed in response to the dual external stimuli consisting of UV irradiation and the subsequent heating.
Inui et al. (Mon,) studied this question.