Precise Patterning of Silk Microstructures Using Photolithography

Photolithography is used in conjunction with a “silk fibroin photoresist” to form precise protein microstructures directly and rapidly on a variety of substrates. High-resolution features in two and three dimensions with line widths down to one micrometer are formed. Photo-crosslinked protein structures guide cell adhesion, providing precise spatial control of cells without requiring adhesive ligands. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.