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Abstract Inspection of surface and nanostructure imperfections play an important role in high-throughput manufacturing across various industries. This paper introduces a novel, parallelised version of the metrology and inspection technique: Coherent Fourier scatterometry (CFS). The proposed strategy employs parallelisation with multiple probes, facilitated by a diffraction grating generating multiple optical beams and detection using an array of split detectors. The article details the optical setup, design considerations, and presents results, including independent detection verification, calibration curves for different beams, and a data stitching process for composite scans. The study concludes with discussions on the system’s limitations and potential avenues for future development, emphasizing the significance of enhancing scanning speed for the widespread adoption of CFS as a commercial metrology tool.
Soman et al. (Thu,) studied this question.