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Abstract Since decades, High Voltage Engineering (HVE) manufactures particle accelerator systems for research and industry. HVE’s product line includes Singletron and Tandetron accelerator systems with terminal voltages of up to 6 MV. They are dedicated to a wide range of applications including ion implantation and irradiation, Ion Beam Analysis (IBA), Accelerator Mass Spectrometry (AMS), and neutron reference fields. In this paper, we give an overview of the different positive and negative ion sources that are applied in these systems. We focus especially on the recent development and the performance of a compact 2.45 GHz permanent magnet ECR bipolar ion source (HVE Model SO-160), used for negative light-ion injection into tandem accelerators. It generates high-current, low-emittance light-ion beams at 30 keV energy. The novelty in the design of this ion source is that it combines direct negative extraction for H − with positive extraction for He + that is followed by charge exchange to He − in a Na-based electron donor canal. The source produces in excess of 250 e µ A of H − and more than 20 e µ A of He − . It is expected the design allows for substantially higher currents, especially for H − .
Annaluru et al. (Wed,) studied this question.